Yacoot, A; Kuetgens, U*; Koenders, L*; Weimann, T* (2001) A combined scanning tunnelling microscope and x-ray interferometer. Meas. Sci. Technol., 12. pp. 1660-1665.

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Abstract

A monolithic x-ray interferometer made from silicon and a scanning tunnelling microscope have been combined and used to calibrate grating structures with periodicities of 100 nm or less. The x-ray interferometer is used as a translation stage which moves in discrete steps of 0.192 nm, the lattice spacing of the silicon (220) planes. Hence, movements are traceable to the definition of the meter and the nonlinearity associated with the optical interferometers used to measure displacement in more conventional metrological scanning probe microscopes (MSPMs) removed.

Item Type:	Article
Keywords:	x-ray interferometry, scanning probe microscopy, nanotechnology
Subjects:	Engineering Measurements Engineering Measurements > Dimensional
Last Modified:	02 Feb 2018 13:17
URI:	https://eprintspublications.npl.co.uk/id/eprint/2040