Fan, Y; Nakanishi, K; Veigang-Radulescu, V P; Mizuta, R; Stewart, J C; Swallow, J E N; Dearle, A E; Burton, O J; Alexander-Webber, J A; Ferrer, P; Held, G; Brennan, B; Pollard, A J; Weatherup, R S; Hofmann, S (2020) Understanding metal organic chemical vapour deposition of monolayer WS2: the enhancing role of Au substrate for simple organosulfur precursors. Nanoscale, 12 (43). pp. 22234-22244. ISSN 2040-3364

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Item Type:	Article
Subjects:	Nanoscience > Surface and Nanoanalysis
Divisions:	Chemical & Biological Sciences
Identification number/DOI:	10.1039/d0nr06459a
Last Modified:	17 Mar 2021 15:36
URI:	https://eprintspublications.npl.co.uk/id/eprint/9063