Huang, X Q*; Shao, J H*; Tsou, C L*; Zhang, S S*; Lu, B R*; Hao, L; Sun, Y*; Chen, Y F* (2017) A novel PMMA/NEB bilayer process for sub-20 nm gold nanoslits by a selective electron beam lithography and dry etch. Microelectron. Eng., 172. pp. 13-18.

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Abstract

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Item Type:	Article
Subjects:	Quantum Phenomena Quantum Phenomena > Nanophysics
Divisions:	Quantum Science
Identification number/DOI:	10.1016/j.mee.2017.02.007
Last Modified:	02 Feb 2018 13:12
URI:	https://eprintspublications.npl.co.uk/id/eprint/7562