Seah, M P (2004) Intercomparison of silicon dioxide thickness measurements made by multiple techniques - the route to accuracy. J. Vac. Sci. Technol. A, 22 (4). pp. 1564-1571.

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Abstract

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Item Type:	Article
Keywords:	gate oxides, nanometre thicknesses
Subjects:	Nanoscience
Last Modified:	02 Feb 2018 13:16
URI:	https://eprintspublications.npl.co.uk/id/eprint/3019