< back to main site

Publications

A novel PMMA/NEB bilayer process for sub-20 nm gold nanoslits by a selective electron beam lithography and dry etch.

Huang, X Q*; Shao, J H*; Tsou, C L*; Zhang, S S*; Lu, B R*; Hao, L; Sun, Y*; Chen, Y F* (2017) A novel PMMA/NEB bilayer process for sub-20 nm gold nanoslits by a selective electron beam lithography and dry etch. Microelectron. Eng., 172. pp. 13-18.

Full text not available from this repository.

Abstract

No abstract available

Item Type: Article
Subjects: Quantum Phenomena
Quantum Phenomena > Nanophysics
Divisions: Quantum Science
Identification number/DOI: 10.1016/j.mee.2017.02.007
Last Modified: 02 Feb 2018 13:12
URI: http://eprintspublications.npl.co.uk/id/eprint/7562

Actions (login required)

View Item View Item