Yacoot, A; Cross, N R (2003) Measurement of picometre non-linearity in an optical grating encoder using x-ray interferometry. Meas. Sci. Technol., 14. pp. 148-152.

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Abstract

X-ray interferometry has been used to characterize the non-linearity in an optical encoder displacement measurement system. Traceable measurements of the non-linearity have been made and an estimation of the uncertainty associated with the measurements is given. Cyclic errors with a magnitude of up to 50 pm and periodicity of the encoder system (128 nm) have been recorded.

Item Type:	Article
Keywords:	nanometrology
Subjects:	Engineering Measurements Engineering Measurements > Dimensional
Last Modified:	02 Feb 2018 13:17
URI:	https://eprintspublications.npl.co.uk/id/eprint/2550