Wang, Y; Shang, X; Ridler, N M; Huang, T; Wu, W (2020) Characterization of Dielectric Materials at WR-15 Band (50–75 GHz) Using VNA-Based Technique. IEEE Transactions on Instrumentation and Measurement, 69 (7). pp. 4930-4939. ISSN 0018-9456

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Abstract

This paper presents an in-depth study of a new VNA based electromagnetic material measurement method relying on a commercially available material characterization kit (MCK). These MCKs provide effectively a guided free-space technique with less stringent requirement on alignment compared to conventional free space techniques. Coupled with time gating, these MCKs employ a simple calibration, composed of Reflect and Thru standards only, prior to taking reflection and transmission S parameter measurements. This MCK-based method complements other conventional measurement techniques, e.g. TDS and resonant cavity, allowing fast broadband dielectric material characterization over the millimeter-wave and submillimeter-wave frequency ranges. In this work, a WR-15 (50 75 GHz) MCK is utilized for measurements of S parameters for seven types of low-loss dielectric material. Their dielectric constant and loss tangent are extracted from S parameters and are compared against literature values. Relatively good agreement is achieved. Moreover, an investigation into the uncertainties of the extracted dielectric constant and loss tangent is performed and reported.

Item Type:	Article
Subjects:	Electromagnetics > RF and Microwave
Divisions:	Electromagnetic & Electrochemical Technologies
Identification number/DOI:	10.1109/TIM.2019.2954010
Last Modified:	12 Oct 2020 14:45
URI:	https://eprintspublications.npl.co.uk/id/eprint/8881