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Inelastic background modelling applied to hard X-ray photoelectron spectroscopy of deeply buried layers: A comparison of synchrotron and lab-based (9.25 keV) measurements

Spencer, B.F.; Maniyarasu, S.; Reed, B. P.; Cant, D. J. H.; Ahumada-Lazo, R.; Thomas, A.G.; Muryn, C.A.; Maschek, M.; Eriksson, S.K.; Wiell, T.; Lee, T.-L.; Tougaard, S.; Shard, A. G.; Flavell, W.R. (2021) Inelastic background modelling applied to hard X-ray photoelectron spectroscopy of deeply buried layers: A comparison of synchrotron and lab-based (9.25 keV) measurements. Applied Surface Science, 541. 148635 ISSN 01694332

Full text not available from this repository.
Item Type: Article
Subjects: Nanoscience > Surface and Nanoanalysis
Divisions: Chemical & Biological Sciences
Identification number/DOI: 10.1016/j.apsusc.2020.148635
Last Modified: 26 May 2021 13:10
URI: http://eprintspublications.npl.co.uk/id/eprint/9159

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