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Summary of ISO/TC 201 Standard: ISO 22415—Surface chemical analysis—Secondary ion mass spectrometry—Method for determining yield volume in argon cluster sputter depth profiling of organic materials

Shard, A G; Havelund, R; Seah, M P; Clifford, C A (2019) Summary of ISO/TC 201 Standard: ISO 22415—Surface chemical analysis—Secondary ion mass spectrometry—Method for determining yield volume in argon cluster sputter depth profiling of organic materials. Surface and Interface Analysis, 51 (10). pp. 1018-1020. ISSN 0142-2421

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Abstract

The International Standard ISO 22415 provides methods to measure sputtering yield volumes of organic test materials using argon cluster ions. The test materials should consist of thin films of known thicknesses between 50 nm and 1 000 nm. The format of the test materials, the measurement of sputtering ion dose, sputtered depth and reporting requirements for sputtering yield volumes are described.

Item Type: Article
Keywords: detection limits, detectability, peak area, uncertainty, XPS
Subjects: Nanoscience > Surface and Nanoanalysis
Divisions: Chemical & Biological Sciences
Identification number/DOI: 10.1002/sia.6686
Last Modified: 21 Oct 2019 14:40
URI: http://eprintspublications.npl.co.uk/id/eprint/8524

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