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Sputtering yields for mixtures of organic materials using argon gas cluster ions.

Seah, M P; Havelund, R; Shard, A G; Gilmore, I S (2015) Sputtering yields for mixtures of organic materials using argon gas cluster ions. J. Phys. Chem. B, 119 (42). pp. 13433-13439.

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The sputtering yield volumes of binary mixtures of Irganox 1010 with either Irganox 1098 or Fmoc-pentafluoro-L-phenylalanine (FMOC) have been measured for 5 keV A2000+ ions incident at 45° to the surface normal. The sputtering yields are determined from the doses to sputter through various compositions of 100 nm thick, intimately mixed, layers. Because of matrix effects, the profiles for secondary ions are distorted and profile shifts in depths of up to 15 nm are observed leading to errors above 20% in the deduced sputtering yield. Secondary ions are selected to avoid this. The sputtering yield volumes for the mixtures are shown to be lower than those deduced from a linear interpolation from the pure materials. This is shown to be consistent with a simple model involving the changing energy absorbed for the sputtering of intimate mixtures. Evidence to support this comes from the secondary ion data for pairs of the different molecules. Both binary mixtures behave similarly but matrix effects are stronger for the Irganox 1010/FMOC system.

Item Type: Article
Keywords: gas clusters, GCIB, ion enhancement, ion suppression, Irganox 1010, layers, organic electronics, organics, polystyrene, SIMS, sputtering, yields
Subjects: Nanoscience
Nanoscience > Surface and Nanoanalysis
Identification number/DOI: 10.1021/acs.jpcb.5b06713
Last Modified: 02 Feb 2018 13:13
URI: http://eprintspublications.npl.co.uk/id/eprint/6879

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