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Engineering and metrology of epitaxial graphene.

Tzalenchuk, A; Lara-Avilla, S*; Cedergren, K*; Syvajarvi, M*; Yakomova, R*; Kazakova, O; Janssen, T J B M; Moth-Poulsen, K*; Bjornholm, T*; Kopylov, S*; Fal'ko, V*; Kubatkin, S* (2011) Engineering and metrology of epitaxial graphene. Solid State Commun., 151 (16). pp. 1094-1099.

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Abstract

Here we review the concepts and technologies, in particular photochemical gating, which contributed to the recent progress in quantum Hall resistance metrology based on large scale epitaxial graphene on silicon carbide.

Item Type: Article
Subjects: Quantum Phenomena
Quantum Phenomena > Nanophysics
Identification number/DOI: 10.1016/j.ssc.2011.05.020
Last Modified: 02 Feb 2018 13:14
URI: http://eprintspublications.npl.co.uk/id/eprint/5224

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