Shard, A G; Yang, L; Ray, S (2009) VAMAS TWA 2, 2009:sub-project A3(d) static SIMS iterlaboratory study Part I: organic depth profiling by cluster ion beams - protocol for analysis. NPL Report. AS 32

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Abstract

This report describes the protocol for analysis in the VAMAS TWA 2, 2009 organic depth profiling study. Procedures for setting the sputter ion beams and analysis regions are provided to ensure the equivalence of data between different instruments. A single reference material is supplied for this study, alternating layers of Irganox1010 and Irganox3114 of total thickness ~400 nm on a silicon substrate. No sample preparation is required from the user and specific guidance is given on sample handling.

Item Type:	Report/Guide (NPL Report)
NPL Report No.:	AS 32
Subjects:	Nanoscience
Last Modified:	02 Feb 2018 13:15
URI:	https://eprintspublications.npl.co.uk/id/eprint/4334