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Elastic scattering corrections in AES and XPS: II. Estimating attenuation lengths and conditions required for their valid use in overlayer/substrate experiments.

Cumpson, P J; Seah, M P (1997) Elastic scattering corrections in AES and XPS: II. Estimating attenuation lengths and conditions required for their valid use in overlayer/substrate experiments. Surf. Interface Anal., 25. pp. 430-446.

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Abstract

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Item Type: Article
Subjects: Nanoscience
Nanoscience > Surface and Nanoanalysis
Last Modified: 02 Feb 2018 13:18
URI: http://eprintspublications.npl.co.uk/id/eprint/4002

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