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Ultrathin SiO2 on Si, VI:evaluation of uncertainties in thickness measurement using XPS.

Seah, M P (2005) Ultrathin SiO2 on Si, VI:evaluation of uncertainties in thickness measurement using XPS. Surf. Interface Anal., 37. pp. 300-309.

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Abstract

No abstract available

Item Type: Article
Keywords: ARXPS, gat oxides, silicon dioxide
Subjects: Nanoscience
Nanoscience > Surface and Nanoanalysis
Last Modified: 02 Feb 2018 13:16
URI: http://eprintspublications.npl.co.uk/id/eprint/3363

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