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Byrne, C*; Brennan, B; Lundy, R*; Bogan, J*; Brady, A*; Gomeniuk, Y Y*; Monaghan, S*; Hurley, P K*; Hughes, G* (2017) Physical, chemical and electrical characterisation of the diffusion of copper in silicon dioxide and prevention via a CuAl alloy barrier layer system. Mater. Sci. Semicond. Process., 63. pp. 227-236.