Byrne, C*; Brennan, B; Lundy, R*; Bogan, J*; Brady, A*; Gomeniuk, Y Y*; Monaghan, S*; Hurley, P K*; Hughes, G* (2017) Physical, chemical and electrical characterisation of the diffusion of copper in silicon dioxide and prevention via a CuAl alloy barrier layer system. Mater. Sci. Semicond. Process., 63. pp. 227-236.

Byrne, C*; Brennen, B; McCoy, A P*; Bogan, J*; Brady, A*; Hughes, G* (2016) In-situ XPS chemical analysis of MnSiO3 copper diffusion barrier layer formation and simultaneous fabrication of metal oxide semiconductor electrical test MOS structures. ACS Appl. Mater. Interfaces, 8 (4). pp. 2470-2477.