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Feasibility of Novel Wafer Scale Imaging Methods for Identification of Defects in Semiconductors for Net-Zero

Koutsourakis, G; Baltusis, A; Wood, S; Blakesley, J; Castro, F A (2022) Feasibility of Novel Wafer Scale Imaging Methods for Identification of Defects in Semiconductors for Net-Zero. NPL Report. TQE 21

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Abstract

Retraction:

NPL Management Limited has retracted the following publication as it contains material and/or data without authorisation for use.

Item Type: Report/Guide (NPL Report)
NPL Report No.: TQE 21
Subjects: Advanced Materials > Non-Destructive Testing
Divisions: Electromagnetic & Electrochemical Technologies
Identification number/DOI: 10.47120/npl.TQE21
Last Modified: 08 Sep 2022 07:28
URI: https://eprintspublications.npl.co.uk/id/eprint/9415
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