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Plasma treated graphene oxide films: structural and electrical studies.

Li, T Y; Patel, T; Banerjee, I*; Pearce-Hill, R; Gallop, J C; Hao, L; Ray, A K* (2015) Plasma treated graphene oxide films: structural and electrical studies. J. Mater. Sci., Mater. Electron., 26 (7). pp. 4810-4815.

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Abstract

The exfoliation of oxygenated functional groups from the 60W hydrogen plasma treated graphene oxide (GO) was investigated using X-Ray diffractometric (XRD), Raman spectroscopic and atomic force microscopic (AFM) techniques. The interlayer spacing of the graphene oxide sheets was found from the XRD pattern to decrease from 0.88nm to 0.35 nm after plasma treatment. The reduced intensity ratio of the D and G peaks of the Raman spectra indicates a decrease in the crystallite size of the sp2 domains due to plasma treatment. Atomic force microscope showed the continuous morphology of the plasma treated film. The electrical properties of plasma treated samples spin-coated on silicon were studied using Van Der Pauw and non contacting microwave techniques. The sheet resistivity determined from Van der Pauw measurements was . The charge mobility of 37.53 cm2V-1s-1 has been determined from Hall measurement technique.

Item Type: Article
Keywords: Graphene oxide, graphene, plasma reduction, electrical properties, Van der Pauw
Subjects: Nanoscience
Nanoscience > Nano-Materials
Identification number/DOI: 10.1007/s10854-015-3122-0
Last Modified: 02 Feb 2018 13:13
URI: http://eprintspublications.npl.co.uk/id/eprint/6743

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