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Cluster primary ions: spikes, sputtering yields, secondary ion yields and inter-relationships for secondary molecular ions for static SIMS.

Seah, M P (2008) Cluster primary ions: spikes, sputtering yields, secondary ion yields and inter-relationships for secondary molecular ions for static SIMS. J. Vac. Sci. Technol. A, 26 (4). pp. 660-667.

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Abstract

A framework is provided to describe the enhanced sputtering yields and secondary ion yields of molecular fragments, from molecules on substrates, achieved when using cluster primary ions. Analysis of published sputtering yield data shows that one particular model of sputtering, that includes spikes, is an excellent quantitative description of the yields for a wide range of monatomic and polyatomic primary ions. Evidence will be shown of the model validity for describing clusters of up to more than 10 atoms over 3 orders of magnitude in sputtering yield. Using data from one primary ion, extremely good descriptions of measurements reported with other primary ions are achieved. This is then used to evaluate the important molecular ion yield behaviour for static SIMS based on data for Irganox 1010. Universal dependencies for the de-protonated molecular ion yields, valid for all primary ions, both single atom and cluster, over 5 decades of emission intensity are obtained. This permits the prediction of the (M-H)- secondary ion yield for different, or new, cluster primary ions, e.g. Bin+ and C70+, for the analysis of organic materials. Optimal primary ion sources are predicted and discussed. For analysing materials, raising the molecular secondary ion yield is extremely helpful but it is the ratio of this yield to the disappearance cross section that is critical. Data are evaluated and a description is given to show how these vary with the cluster type to provide a further universal dependencies.

Item Type: Article
Keywords: cluster sputtering, organic monolayers, SSIMS, surface analysis,
Subjects: Nanoscience
Last Modified: 02 Feb 2018 13:15
URI: http://eprintspublications.npl.co.uk/id/eprint/4178

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